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micro resist technology GmbH

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	General Archive
	November 2004		Die micro resist technology GmbH participated with 2 poster on contributions "Industrieforum Nanofabrikation - Neue Dimension der Mikrosystemtechnik" The event took place on Friday, 12.11.2004 at the BESSY GmbH in Berlin. The latest results showed the higharise, chemically enhanced Positive-Photoresist XP mr-P 80 AV (to 80 µm layer height) and Structuring on higharise SU-8 (300 µm - 3600 µm layer height) with Deep X-ray lithography. To download the poster in pdf format, please click on the pictures! (90 kB / 258 kB)
	September 2003 MNE in Cambridge		Poster contribution„Complete Technology Complete 3-D UV Microfabrication Technology on Strong Sloping Topography Substrates Using Epoxy Photoresist SU-8” auf der traditionsreichen On the traditional international conference „Micro and Nano Engineering MNE 2003” in Cambridge (Großbritannien). An article for the conference band of the journal „Microelectronic Engineering” be prepared. more » Poster »
	June 2003 Harmst 2003 Monterey, California USA		Successful participation in the HARMST 2003, a conference in Monterey, CA with a report of cooperation in the field Deep X-ray lithography with Nano®SU-8. more »
	January 2003 New product		Since the beginning of the year expand ORMOCER®e The product offerings of our company. ORMOCER®e Is organically modified Ceramics, the properties of inorganic hard Ceramics with the soft properties of organic polymers are united. The application areas are diverse: from the surface finishing to medizienischen tooth filling. Our company will focus on the production of materials for microoptische components, which in the field of telecommunications and Lifesience apply to specialize.

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