The table contains summarised information on recommended process chemicals for positive photoresists.

Detailed information, such as recommendations for different substrates, film thicknesses and applications, can be found in the processing guidelines.

Thinner

Positive Resist series Thinner
ma-P 1200

ma-T 1050

ma-P 1275/ ma-P 1275HV

ma-T 1050

ma-P 1275G

ma-T 1050

Primer

Positive Resist series Primer
ma-P 1200

HMDS, SurPass 4000

ma-P 1275/ ma-P 1275HV

HMDS, SurPass 4000

ma-P 1275G

HMDS, SurPass 4000

Developer metal ion containing and free

Positive Resist series Developer Metal ion containing Developer Metal ion free
ma-P 1200

ma-D 331, ma-D 331/S

mr-D 526/S

ma-P 1275/ ma-P 1275HV

ma-D 331, ma-D 331/S

mr-D 526/S

ma-P 1275G

-

ma-D 532/S, mr-D 526/S

Developer on critical substrates, e.g. Al

Positive Resist series

Developer on critical substrates, e.g. Al

ma-P 1200

Microposit Developer concentrate

ma-P 1275/ ma-P 1275HV

Microposit Developer concentrate

ma-P 1275G

-

Remover solvent based

Positive Resist series

Remover solvent based

ma-P 1200

mr-Rem 700, mr-Rem 660, mr-Rem 400, mr-Rem 500

ma-P 1275/ ma-P 1275HV

mr-Rem 700, mr-Rem 660, mr-Rem 400, mr-Rem 500

ma-P 1275G

mr-Rem 700, mr-Rem 660, mr-Rem 400, mr-Rem 500

 Remover strongly alkaline

Positive Resist series

Remover strongly alkaline

ma-P 1200

ma-R 404/S

ma-P 1275/ ma-P 1275HV

ma-R 404/S

ma-P 1275G

ma-R 404/S

 Ätzlösung

Metal

Etchant

Chrome

Chrom etch 18