Negative Resists for  laser lithography 

  • Effektive for  direct laser writing @ 405 nm 
  • Variety of viscosities for different film thicknesses in one spin-coating step

For pattern transfer processes: Master/ template manufcature, etch mask, mould for electroplating

Beispiel Produkt Application Thickness range PDF Details
mr-DWL series

Permanent application, conventional pattern transfer

3 µm – 100 µm