Be part of the NIL INDUSTRIAL DAY 2017!

In May 2017, the 7th edition of the NIL Industrial Day symposium will be held in Berlin, Germany (May 2-3, 2017). The NIL Industrial Day is the major event supplementing the academic and scientific oriented conferences with the aim to inform industrial early adopters and those companies evaluating to invest in Nanoimprint Lithography (NIL) as manufacturing method on the status of NIL for production purpose.

In this year’s edition, we seek to make another commitment not only to Europe’s growing NIL community. We will also include contributions from Singapore, USA, and Japan in order to provide information on technology & market developments from around the world. International experts from academia and industry will discuss what NIL offers today, which partners build the “total-solution” ecosystem, and what can be expected as future outcome from current research activities.

The program will cover the following topics …
•           Nanopatterning Applications in Life-Sciences & Photonics
•           Industrial Nanopatterning: Solutions
•           Inudstrial Nanopatterning: Production
•           Future Visions & Associated Technologies

Take advantage and be involved in …
•           Technology discussions initiated by 20 oral contributions
•           Several hours of networking opportunities with approx. 100-130 highly skilled participants
•           Newest developments displayed at the technical exhibition

Further information on detailed program, venue and registration will be available soon on the frequently updated conference website:

Meet your community at NIL Industrial Day 2017! We are looking forward seeing you in Berlin in May!

Yours sincerely,
The Organizing Committee
of NIL Industrial Day 2017